CBE 179 Homework - Lithography
Due Monday, 2013.11.03
Write a brief summary (1-2 paragraphs) for each technique, discussing the importance of the technique, how it is performed, and its current and future status in industry. Cite your sources.
- Chemically Amplified Resist
- Immersion Lithography
- Optical Proximity Correction
- Phase Shift Masks
- Double (Multiple) Patterning
- Nanoimprint Lithography (what different kinds are there?)
- Extreme UV Lithography (what wavelengths? why is this technique so difficult to perform?)
- Direct-Write (electron, proton beam) Lithography
- Dip-Pen Nanolithography
Lithography expert Chris Mack's lectures may be useful.